The Project

“Project Noreia” entitles the design and development of a highly sophisticated PVD deposition plant, which consider state of the art developments in automation and control as well as deposition techniques. The design and development is conducted in a framework between the Institute of Materials Science and Technology (Prof. Paul H. Mayrhofer) and the Faculty of Electrical Engineering and Information Technology within the Vienna University of Technology.

The aim of the cutting-edge concept is to connect the advantages of industrial deposition plants and labor scale systems to provide an ideal setup for application oriented coating development. Industrial processes are always qualified through high deposition rates and optimal target erosion which is strongly linked to enhanced target power densities and at least larger target geometries. Labor scale deposition systems protrude through Ultra High Vacuum (UHV) conditions and a huge variety in process controlling as well as individual target powering and positing to deposit most diverse coating architectures. Noreia combines all these aspects within one system.


In addition, Noreia is equipped with state of the art magnetron systems powered by High Power Impulse Magnetron Sputter (HiPIMS) generators to combine the advantageous of DC magnetron sputtering and arc-evaporation without their drawbacks of shadowing effects and macro particles. A load lock system gives the possibilities for an easy substrate exchange as well as UHV conditions. To precisely influence the deposition parameters such as bias voltage or substrate temperature and hence film properties, Noreia is provided with an innovative substrate heating and powering system to control nucleation and film growth.

All deposition parameters such as target powering, substrate heating, gas flow, pressure control, cooling system, etc. are controlled through a Programmable Logic Controller (PLC) to provide the user highest possible comfort in usage as well as a highest freedom to influence the deposition process.

More details about the concept and the current project status can be founded in Concept and News. If you require more details please feel free to contact us under